Used AIXTRON AIX 2800 G5 HT #9278265 for sale

AIXTRON AIX 2800 G5 HT is a chemical vapor deposition (CVD) reactor designed specifically for device fabrication. This type of reactor is used for producing semiconductor- and optoelectronic-type materials and components, such as silicon wafers, for a variety of products that contain electrical components. AIXTRON AIX 2800G5 HT is equipped with a powerful ion source and an innovative plasma generator, allowing for the highest deposition temperatures of up to 1000 °C in a variety of process atmospheres. AIX 2800 G5 HT is a whole-wafer deposition equipment, meaning that it deposits material across the entire surface of a single wafer during the reaction. This makes it ideal for applications on both small and large scale batches. Additionally, the G5 HT's reaction chamber is equipped with a driverless robot arm, providing precise motion control of the wafer relative to the deposition system, allowing for the optimization of thermal uniformity and high as-deposited qualities. AIX 2800G5 HT is extremely efficient and its power handling capabilities are unparalleled. It uses a highly controllable and reliable flow unit with a reliable gas handling machine. The gas handling tool is closed and automated, ensuring the highest levels of efficiency and safety in the processing of its materials. AIXTRON AIX 2800 G5 HT also features research-grade chamber walls, offering unparalleled homogeneity of the deposition process. AIXTRON AIX 2800G5 HT's temperature control asset is one of its most impressive features. This model provides an extremely precise and consistent heating of the wafer, thus providing superior temperature control and level of homogeneity induction across the wafer. This also improves deposition uniformity and avoids any thermal damage that may occur to the substrate material. In addition, its flexible configuration and control equipment enables the user to make real-time adjustments to the deposition system, ensuring the best process outcome. Overall, AIX 2800 G5 HT is an advanced and reliable CVD unit, providing a fast and cost-efficient device fabrication solution. Its long-term stability, machine efficiency, and wide process range makes it an optimal choice for a variety of industrial applications, and its integrated features make it suitable for research work as well.