Used AIXTRON AIX G5 HT #293690958 for sale

AIXTRON AIX G5 HT is a high-performance, high throughput metal-organic chemical vapour deposition (MOCVD) reactor used for the fabrication of advanced materials and devices such as semiconductors. The reactor employs highly sophisticated processes to ensure the correct exposure of various materials to the plasma and substrate chamber components. Field of Important Applications AIXTRON AIX G 5 HT is capable of producing a wide range of materials in a cost effective manner. It is well known in the industry for its high selectivity across various materials substrates, ranging from silicon to high-performance materials such as gallium arsenide for electronics and optoelectronics applications. Moreover, highly repeatable production processes and process control allow for increased dimensional and structural control and uniformity of the deposited films across large areas. G5 HT Programmable Process Technologies AIX G5 HT offers a suite of process technologies that are key to the success of any material deposition. The programmable deposition sources allow users to work with various reactive species, while the gas feeding systems enable the use of carrier gases for the supply of the reactive species into the reaction chamber. Further, high frequency generator power supplies can generate fully customised pulse waveforms to increase the adhesion and improve the uniformity of the films. Plasma Sources and Substrate Heating The high-performance plasma source and advanced substrate heating technology in AIX G 5 HT allows for precise film production with better control of the chemical, structural and mechanical composition of the films over large areas. The plasma source in the G5 HT is powerful enough to achieve fast and reliable etching and deposition processes, which are key for the production of advanced semiconductor devices. Safety and Regulatory Compliance AIXTRON AIX G5 HT is designed in full compliance with the relevant safety regulations, to ensure safe operation and optimal safety for the operating personnel. Moreover, the reactor is over-pressured and under-pressured to enable rapid evacuation of hazardous materials and vapours. Finally, AIXTRON AIX G 5 HT is designed for energy efficiency and it can operate in semi-sealed mode to ensure long process times.