Used AIXTRON AIX G5+ #293657949 for sale

AIXTRON AIX G5+ is a high-performance chemical vapor deposition (CVD) reactor designed for the deposition of devices such as III-V compound semiconductor materials, nanoparticles, and thin-film multilayers. Built from sturdy and durable components, the equipment is highly reliable and offers excellent uptime and process yields. AIX G5+ reactor has a large, enclosed chamber for depositing materials, with a diameter of up to 1.1 meter and a height of up to 0.7 meter. The chamber is surrounded by a temperature-controlled and oxygen-purged environment, that can be set and regulated to ensure the optimal process environment. The chamber is sealed and pressure is controlled to protect the delicate processed materials form external contamination. The interior of the chamber is high-temperature resistant and features high-performance heating elements, which are equipped with their own temperature controllers ready to be operated in a variety of process modes - such as pulsed or continuous flow - and either horizontally or vertically oriented. The chamber is also designed to deliver a uniform temperature throughout the material that is being processed, allowing for a high-quality deposit over large areas. AIXTRON AIX G5+ reactor also features an advanced automatic positioning system, which can rotate the components used for material deposition. This allows for an increased number of parameters used for deposition processes, allowing for the deposition of more challenging materials, such as those requiring different metallization steps. AIX G5+ is highly reliable and offers excellent uptime and process yields. Its advanced software and user interface guarantee efficient and optimized batch processing, with application-specific recipes ready to be deployed quickly and accurately. Furthermore, the unit can be easily and quickly maintained, while support is available quickly and locally. In conclusion, AIXTRON AIX G5+ is a reliable and high-performance reactor, ideal for the deposition of a variety of III-V compound materials, thin-film multilayers and nanoparticles. Its advanced machine and user interface guarantee easy maintenance and batch processing, for higly repeatable and consistent results. The tool is highly reliable and is designed to offer excellent uptime and process yields, making it an ideal tool for depositing challenging materials.