Used AIXTRON AIX #9409484 for sale

AIXTRON AIX is a chemical vapor deposition (CVD) reactor produced by AIXTRON SE, a major German semiconductor equipment manufacturer. AIX reactors are used in the production of thin film semiconductor materials such as silicon, silicon dioxide and doped silicon. AIXTRON AIX reactor is based on metal-organic chemical vapor deposition (MOCVD) technology and can be used in all three CVD modes: atmospheric pressure chemical vapor deposition (APCVD), low pressure chemical vapor deposition (LPCVD) and high pressure chemical vapor deposition (HPCVD). The reactor is designed for use as a single source for CVD in production of all materials. It uses a two stage process, with the first stage being a reactant preheating chamber followed by the second stage being a reaction chamber. The preheating chamber is heated by an induction oven to the required operating temperature. The reaction chamber is heated by gas-fired infrared lamps. The process gas is introduced into the reactor at the point of reaction. The process is regulated by a precise control system. AIX reactor is able to produce high quality films of defined thicknesses and precise geometry. The super clean environment in the reactor ensures excellent uniformity and reproducible optical and electrical properties. The films can be grown in single or multiple layers and are often used in the manufacture of semiconductor devices such as transistors, diodes and other active and passive electronic components. AIXTRON AIX reactor is available in several models including the standard AIX600, AIX1200 and AIX1800. Each model offers increased performance characteristics and the ability to scale up. The AIX1200 and AIX1800 offer a greater degree of process automation and flexibility. The reactor can also be equipped with automated optical monitoring systems to measure the films being produced. AIX is a reliable and versatile reactor offering a high degree of control and flexibility. As well as being used for the manufacture of semiconductors, it can also be used for the production of other thin films such as dielectric, reflective and transparent layers for optical components. The reactor is well suited for high volume production and is suitable for use in cleanroom environments.