Used AIXTRON CCS 3X2 FT #9218419 for sale

AIXTRON CCS 3X2 FT is a versatile, advanced plasma Enhanced Chemical Vapor Deposition (PE-CVD) reactor designed to achieve high-quality thin films for a variety of applications. This reactor can create thin films of up to 100 nm thickness in a wide range of materials including oxides, nitrides, diamond, and metals. It is suitable for processes requiring high deposition rates, high purity, and excellent uniformity. This reactor has a 3X2 foot Stainless Steel Encapsulated Vacuum Chamber with Viewports, which can be used to monitor the progress of the deposition process in real time. It is equipped with a powerful, highly uniform plasma source supported by the AutoClamp system, which reduces loading and unloading time. The AutoClamp system also provides precise and repeatable substrate clamping which minimizes particle generation. The PE-CVD process is also optimized by applying energy via Magnetron or Filament Cathodes to the gas mixture, in order to break down precursors into reactive species and form thin films with increased material properties. CCS 3X2 FT reactor utilizes sophisticated hardware and software to directly control the deposition parameters with ease. The software can maintain and log temperature, pressure and deposition rate with extensive data logging capabilities, as well as provide superior data analysis in real-time. In addition, it is compliant with SEMI F47-0291 standards, which helps ensure the highest levels of process control, accuracy and repeatability. This reactor is designed for maximum uptime and is equipped with several features for enhanced productivity: advanced PLC Control for extensive process automation, automatic process exhaust, temperature control with PID control and Automated Gas Shutdown, and on-board diagnostic tools for easy analysis of the various processes. It is an ideal solution for thin film deposition of small and large batch sizes, with a high level of process control and reliability. Its other advantages include: fast deposition rates and cycle times, low energy consumption, minimal particle generation, excellent uniformity, variability and customizability, easy maintenance, and unmatched process quality. This flexible and economical reactor is the perfect choice for industrial thin-film deposition applications.