Used AIXTRON CCSH 30x2 #9353180 for sale

AIXTRON CCSH 30x2 is a chemical vapor deposition (CVD) reactor used to deposit thin films for a variety of applications. The reactor utilizes a dual-horizontal cylinder design, which allows for high deposition rate and uniformity. The reactor also supports a wide array of process gases and source materials, such as silanes for silicon-based layers and organometallics for other metal layers. CCSH 30x2 is designed to provide maximum uniformity over the entire substrate by utilizing a two-zone thermal-coldwall technology. This secondary chamber helps to evenly spread the substrates within the chamber and also minimize undesired reactions between source materials and process gas. The reactor comes with two in-situ mass-flow controllers to accurately control the pressure of the process gases. AIXTRON CCSH 30x2 also features in-situ monitoring capabilities. A programmable scan system allows precise control of substrate temperature and an optical pyrometer allows for quick and precise measurements of the substrate temperature. A quartz window in the chamber enables optical measurements of the deposition process like layer growth rate and layer composition. In CCSH 30x2, the process chamber is heated to temperatures up to 1000 °C. The chamber is filled with a process gas, such as nitrogen or helium. Model sources, such as silanes and organometallic, then vaporized and enter the chamber. The deposition rate can be adjusted by manipulating the process gas flow rate. AIXTRON CCSH 30x2 can be operated either in a batch mode or a continuous process. In the batch mode, the substrates are loaded into the chamber, the process begins, and the deposition is allowed to occur until the program is complete. In the continuous mode, the substrates are loaded into the chamber, and CCSH 30x2 deposits the layers on the substrate as they move through the chamber. This allows for high-throughput deposition, as the reactor can run continuously without manual handling of the substrates. AIXTRON CCSH 30x2 reactor is a useful tool for depositing thin-film materials due to its wide range of functions, uniformity, temperature control, and large substrate size. It provides an excellent platform for producing films with high repeatability and precision.