Used AIXTRON Crius 19x2" #9390893 for sale

AIXTRON Crius 19x2 is an advanced-technology chemical vapor deposition (CVD) reactor equipment. The system is designed for use in research, development and production applications of small molecular compound materials. The Crius allows for the production of advanced materials such as carbon nanostructures and polymers, as well as a variety of novel compounds, including quantum dots, graphene, and other nanostructures. The Crius 19x2 is designed to provide users with advanced technology, high-productivity, and consistent and repeatable performance for a wide range of deposition requirements. The unit features advanced process control, efficient cooling and excellent process repeatability. It also allows for the co-deposition of materials, enabling advanced material designs to be quickly produced. The Crius 19x2 reactor has a temperature range of up to 1,000°C and a deposition rate of up to 33 nanometers per hour. It also offers a variety of process control and monitoring options, such as an advanced azimuthal and lateral scanner, which enables precise programmable control of the deposition process. This greatly improves substrate uniformity and minimizes variation between batches. The machine includes a state-of-the-art gas distribution tool that integrates dynamically with the process parameters to ensure a well-defined and precise reaction environment. With a precise blend of precursor gases, the Crius 19x2 can deposit an array of materials with precise control over the deposition characteristics. In addition, the gas asset can also be used to monitor and control temperature, pressure and other parameters during the course of the deposition process. The Crius 19x2 also features a robust control model, allowing users to quickly and easily set and change parameters. This equipment is backed up by an intuitive graphical user interface, making the reactor easy to use and operate. Additionally, the Crius 19x2 can also be integrated with AIXTRON OpenALYX software for further control and optimization of the deposition process. AIXTRON Crius 19x2 is an extremely robust CVD reactor system that offers precise control of the deposition process and the ability to co-deposit multiple materials. Its excellent process repeatability, precise control, and advanced process monitoring make it an ideal unit for those performing production, research, and development applications in the small molecule and nanostructure material space.