Used AIXTRON Crius 30x2" #293587436 for sale

AIXTRON Crius 30x2 is a polysilicon deposition reactor designed for the production of a variety of electronic devices. The reactor utilizes an advanced high-frequency plasma source and ablation source to form a polysilicon film onto various wafers. The Crius 30x2 features a 30cm x 2m process chamber, making it ideal for large-scale production. The process chamber is made of stainless steel and is housed in a pulse-biased and frequency-modulated capacitively coupling process chamber. The RF power is applied through a pair of graphite electrodes, which are connected to a high-frequency power supply. The power supply features adjustable voltage- and frequency-controlled stages, allowing for different conditions such as reactant molar ratios and substrate temperatures. The process gas supply for AIXTRON Crius 30x2 consists of a mixture of silane and a carrier gas, such as argon. The silane evaporates within the chamber and reactants dissociate to form polysilicon film layers. The temperature of the chamber can be controlled by the heating power of the end-block, where the wafer is placed. Furthermore, AIXTRON Crius 30x2 has integrated pressure control, enabling the appropriate deposition pressure for the layer thickness of the product. The chemical and structural properties of the films can be monitored using in-situ diagnostics such as spectroscopy and optical encoders. The reactor also features an integrated robot arm unit which is used to transfer the wafers and in-situ monitors. AIXTRON Crius 30x2 provides a reliable and consistent process for the high-quality deposition of electronic devices and is engineered to deliver superior performance and reliability in production environments. Its advanced design ensures precise process control and close monitoring to ensure consistent product quality. This reactor offers an economically-efficient solution for large-scale production and is suitable for a variety of production processes.