Used AIXTRON Crius 31x2" #293587438 for sale

AIXTRON Crius 31x2 is a high-end chemical vapor deposition (CVD) reactor designed to meet the most demanding requirements of modern semiconductor and materials research. Featuring a large-area substrate capacity, the Crius 31x2 is able to accommodate wafers up to 200mm in diameter and up to two substrates at a time. It also supports multiple source configurations, allowing for a wide range of research applications including Metal-Organic Chemical Vapor Deposition (MOCVD) deposition, Plasma Enhanced Chemical Vapor Deposition (PECVD), Atomic Layer Deposition (ALD), and more. The Crius 31x2 offers an advanced atmosphere control equipment that provides accurate process control and repeatable capability. This system supports precise temperature, pressure, gas composition and flow rate adjustment for each substrate and source with independent control for up to four sources. Dual remote load lock design also allows for multiple processes or rapid substrate exchange. The Crius 31x2 also features a range of additional features, such as AIX Software Suite, which allows for on-the-fly process optimization. The reactor also offers an intuitive user interface including a high resolution touch screen display and intuitive software program. The Crius 31x2 is designed to ensure that all processes are safe, reliable, and repeatable. It offers robust safety features, including over-temperature protection, pressure protection and ISO 14644 cleanroom certification. The Crius 31x2 utilizes a robust heating and cooling unit that can quickly adjust temperatures up to a maximum range of 300°C. The machine also features fast response times and low thermal energy dissipation to ensure repeatable, uniform temperature profiles across the wafer. Furthermore, the Crius 31x2 features an integrated plasma control tool that allows for optimized uniformity, repeatability, and long process times. In addition, the Crius 31x2 provides advanced modularity for effective process dilution control, multi-zone heating and cooling, and precise gas or carrier gas flow measurements. The modularity also includes optional for cyclic processes, such as preheat, deposition, and cool down in integration with the standard program flow. Overall, AIXTRON Crius 31x2 is an advanced, reliable, and repeatable CVD reactor offering high levels of process control and repeatable capability. It offers vast application possibilities, advanced safety features, and an adaptive control asset that optimizes process times and repeatability.