Used AIXTRON Crius 31x2" #293587440 for sale

Manufacturer
AIXTRON
Model
Crius 31x2"
ID: 293587440
Vintage: 2008
MOCVD System 2008 vintage.
AIXTRON Crius 31x2 is an advanced MOCVD epitaxial growth reactor developed for a wide range of applications in optoelectronic and semiconductor production. This reactor is ideal for high-performance thin-film growth on a variety of substrates, enabling precise control of thickness, doping, and crystalline quality. The Crius 31x2 is equipped with a unique split-pocket three-zone quartz reactor, delivering high-quality films with precise dopant distributions over large areas. The reactor features a 31x2 inch area with a split-pocket design, allowing independent control of the growth temperatures in both pockets. Each pocket is equipped with two high-power, fast-response AC resistive loads, with a maximum power of 3.2 kW and a temperature tuning range of 500 to 1,450 °C. Additionally, this reactor has two variable temperature zones: an upper zone used to preheat and form the substrate, and a lower zone used to grow the epitaxial layers. The Crius 31x2 includes a process control computer for full, real-time control of the control parameters. The fast response of the AC heating elements allows for the precise control of temperature profiles and a precise control of dopant concentrations in the films. The process control computer is equipped with an advanced software package for detailed recipes and data analysis. The reactor is also equipped with a state-of-the-art gas pump configuration with automatic control of gas composition to ensure the highest-quality films with accurate doping levels. AIXTRON also offers optional advanced automation features to minimize operator intervention, reduce setup time and optimize growth rate. The system also includes a durable, effective wafer handling system for improved substrate loading, unloading, and handling. The Crius 31x2 offers quality, highly uniform epitaxial films that can be tailored for innovative device applications. Its precise control of temperature and dopant concentrations ensures outstanding optoelectronic and semiconductor device performance. The inherent low-maintenance requirements, long lifetime, and superior results make AIXTRON Crius 31x2 an ideal choice for leading-edge device production.
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