Used AIXTRON Crius 31x2 #293587441 for sale

AIXTRON Crius 31x2 is a Low Pressure Metal Organic Chemical Vapor Deposition (MOCVD) reactor that is designed to produce high quality film layers at a low cost. This reactor is used in many applications ranging from compound semiconductor device production to solid-state lighting. AIXTRON CRIUS 31 X 2 is an ideal choice for those looking for a high performance at a relatively affordable cost. Crius 31x2 is a three-zone vertical reactor with a single 300 mm quartz susceptor capacity. It is powered by a Varian 6100 source, and has a max wafer size of 2.5". The reactor also includes a horizontal gas injector and nine gas sources. Its total operational pressure is 10T with a maximum temperature of 1300°C. CRIUS 31 X 2 is capable of producing high quality device layers and epitaxial structures. The process gases which are injected into this reactor include HCl, Hydrogen, Arsenic, Phosphine, Silane, and ammonia. These gases react to form a gas-phase reaction of semiconductor materials, producing electronic and optical devices. AIXTRON Crius 31x2 has a number of safety features, ranging from an emergency gas shut-off system to the capability to vent off dangerous hydrogen gas if need be. Additionally, AIXTRON CRIUS 31 X 2 features collision-avoidance technology, to help prevent any accidental collisions of the susceptor during operation, significantly reducing the chance of damage. Overall, Crius 31x2 is an affordable, high-performance and safe MOCVD reactor. It is ideal for those looking to produce quality device layers and epitaxial structures at a low cost. CRIUS 31 X 2 is a reliable option for applications ranging from compound semiconductor device production to solid-state lighting.