Used AIXTRON Crius 31x2 #293587443 for sale

AIXTRON Crius 31x2 is a chemical vapor deposition (CVD) reactor designed to optimize the crystal growth of materials such as III-V, II-VI and oxide semiconductors. It is designed with a low-pressure, heterogeneous layout and uses a swing-arm showerhead, allowing a high degree of uniformity across the substrate. The equipment is equipped with a liquid and gas delivery system, along with an electron cyclotron resonance (ECR) plasma source, allowing for precise control of two separate species of reactant gases in the process. The Crius uses a low-pressure (2 - 150 mbar) process chamber to manage growth of diverse materials and presents a unique cost-effective solution for delivering high quality, large area crystalline materials. AIXTRON CRIUS 31 X 2 is a reaction chamber that can grow multiple engineered crystal layers from a substrate by using advanced chemical vapor deposition (CVD) and advanced plasma-enhanced CVD(PECVD) processes. The reactor operates at a low to medium pressure with a homogeneous cluster-type showerhead, which provides exceptional uniformity across the substrate and excellent compatibility with other advanced processing techniques. The ECR source applied in the process ensures the uniformity of the process. The advanced technology of Crius 31x2 makes it suitable for the growth of thin-film metal, metal-oxide, polycrystalline silicon and other layered materials for a variety of applications such as display and semiconductor fabrication, communications and MEMS (Micro-Electro-Mechanical Unit) industries. The reactor is fitted with two independent substrate holders, allowing one to be processed while loading and unloading take place on the other. The machine also features an adjustable swing-arm showerhead, which provides perfect uniformity across the substrate. The reactor also features a high temperature range of 300-1000°C, resulting in improved growth rates with extremely low pressure needs, making the tool ideal for processes that require highly accurate and controllable conditions. CRIUS 31 X 2 is the perfect solution for research, development and applications that require highly customizable processes, allowing customer specifications to be easily tailored to meet their process requirements.