Used AIXTRON Crius 31x2 #293587444 for sale

AIXTRON Crius 31x2 is a commercially available reactive ion etching equipment that has been designed for precise and repeatable processing of substrates. It is equipped with an advanced process control system that provides high throughput and repeatable results. Its user-friendly control panel offers precise control of the entire etching process. The unit is equipped with a powerful 31 kW transverse RF power supply, a unique, highly precise, and specialized direct etch chamber, and a reliable robot machine for loading and unloading substrates. The proprietary transverse RF power supply is equipped with a high input voltage frequency of 13.56 MHz that is adjustable between 6.0 to 30 W, allowing for precise control of etch rates. The etching process is monitored and adjusted by the controller, which supports contactless control, even with small substrates, ensuring precise and repeatable results. In addition, the innovative, high accuracy direct etching process chamber is designed to minimize power consumption while still providing large uniform etch cavity depths. Due to its high process stability and repeatability, AIXTRON CRIUS 31 X 2 is ideal for high volume production and industrial applications. It is capable of etching up to 100 wafers with precision and repeatability in 10 minutes, with a wafer size of up to 200 mm and a etch depth greater than 20 μm. In addition, it is equipped with software packages for predictive process control and real-time data logging. Furthermore, it is also compatible with standard COTS process recipes and gas boxes. Crius 31x2 comes with a robot that can be used both as a carrier in the etching chamber and as a pallet for substrate handling in the front loading chamber. This provides excellent flexibility for up to 40 wafers to be processed in one process cycle for a higher rate of throughput. The high positioning accuracy of the unloading and loading process reduces downtime, enabling an uninterrupted production process. Overall, CRIUS 31 X 2 is well-suited for etching and high volume production applications and is designed with a range of features that maximize productivity. Its precision and repeatability make it a reliable tool for the required applications.