Used AIXTRON Crius 31x2 #293587446 for sale

AIXTRON Crius 31x2 is a three-zone reactor for epitaxial growth and deposition of semiconductor films and other materials. AIXTRON CRIUS 31 X 2 is a horizontal cold wall reactor configured with three zones. The equipment operates with either a single or multisource configuration using either RF or DC power. The reactor features advanced process control capabilities, enabling users to accurately control process parameters. Crius 31x2 has a loadlock and low temperature entry chamber, which allow for loading and transport of samples in a secure atmosphere. Additionally, the loadlock chamber is equipped with an oven for pre-treatment of substrates prior to introduction. The left and right sources are equipped with movable shields for zone-by-zone flow control, which allows for independent control of flux for the different material films. The reactor also includes a vertical growth zone and a substrate semiconductor holder, which offers precision actuation and positioning. The substrate holder is capable of rotating the substrate up to 360 degrees, allowing for uniform deposition and growth. Temperature control is achieved using a combined hot wall and cold wall process heating system, which provide temperature uniformity across the substrate holder. Additionally, CRIUS 31 X 2 features an on-board optical unit and spectrometer. The optical machine is used to monitor the growth process, while the spectrometer can be used to analyze the film quality and its energy bandgap. A range of pressures are also available in AIXTRON Crius 31x2, with ranges between 30 mTorr and 760 Torr. In terms of safety, AIXTRON CRIUS 31 X 2 comes standard with both manual and programmable safety interlocks, allowing for safe operation of the tool. Additionally, a remote monitoring asset is included, which allow for real-time status of the model during operation. This feature further enhances the safety of the equipment, as well as providing advanced process monitoring. In conclusion, Crius 31x2 reactor is a powerful epitaxial growth system that utilizes advanced process control, load lock, and substrate holder capabilities to provide uniform deposition and growth. Its advanced optical unit and spectrometer allow for accurate analysis of films and their properties. The reactor also includes safety interlocks and remote monitoring, which further enhance its safety and reliability.