Used AIXTRON Crius 31x2 #293650409 for sale

AIXTRON Crius 31x2 is a process reactor designed for applications in the semiconductor industry. It is a remote plasma featuring dual-zone deposition, specifically designed for MBE and VPE growth processes. As a dual-zone equipment, AIXTRON CRIUS 31 X 2 allows for independent temperature control of both the main and auxiliary process chambers. The main chamber is typically used for MBE, enabling processing of a variety of materials with excellent temperature uniformity even under high-pressure conditions. This temperature uniformity is possible thanks to the chamber's uniform hot-wall design, which includes a triax-graphite insert for effective thermal isolation. This design also minimizes heat leakage to the environment, improving efficiency of the system. The auxiliary chamber is generally used for vapor-phase deposition techniques such as VPE. It features plasma formation using remote inductive coupling to an internal electrode, generating highly uniform plasmas with a wide range of plasma powers, comparable to those of high-end PECVD and ICP sources. The cold-wall design of the chamber also ensures good thermal insulation, eliminating thermal gradient in the deposition zone. This ensures consistent high deposition rate and layer quality. Crius 31x2 is also extremely flexible, supporting a wide range of substrates, wafers, and substrates holders. Its versatile loading chamber enables optimized substrate heating and cooling, as well as deposition of materials with varying diffusion lengths and substrate material densities. It also features aseptic loading and unloading, ensuring clean, contamination-free process. To maximize process efficiency, CRIUS 31 X 2 is equipped with a multitude of sensors, including temperature sensors and an optical emission sensor. These monitor thermal conditions and enable precision control over deposition layers, even during rapid thermal or compositional transitions. Finally, the unit is also designed for user convenience. Its built-in control and monitoring machine is intuitive and user-friendly, allowing for easy operation, data logging, and tool diagnostics. This ensures full reproducibility of processes and top-notch results in production.