Used AIXTRON Crius 31x2" #9169077 for sale

AIXTRON Crius 31x2 is a two-zone Chemical Vapor Deposition (CVD) reactor of exceptional performance and versatility. It is especially formulated for industrial use, and is one of the most advanced reactors in its field. The reactor has the capability to create polymeric films of extremely high quality in terms of both material uniformity and stability, making it a valuable tool for companies involved in a variety of industrial applications such as semiconductors, OLED and solar, as well as medical implant devices. The Crius 31x2 is equipped with two processing zones with a temperature range of up to 950 °C. This allows users to process different materials in each zone to produce a variety of films. It can feature 4-channel gas supply options, allowing the delivery of up to 4 gases at the same time, and is fitted with a 25 cm diameter susceptor. The reactor provides a very stable and uniform temperature distribution with a high temperature gradient across the susceptor surface. This highly precise control is enabled by the built-in vertical quick-heating/cooling module. AIXTRON patented gas mixing display system ensures optimal accuracy of the gas mixture in the range of parts-per-million. In addition, the Crius 31x2 is outfitted with a miniFDC™ (Fourier-domain Cascade multivariate Gas Controller) to prevent any disturbances in the film formation process caused by abrupt changes in the gas composition. The miniFDC provides up to two independent control loops of up to four gases and offers an easy and precise control of the film formation process. The reactor also has an integrated monitoring system that allows users to keep track of all parameters, including pressure, temperature, and gas mixtures. This monitoring system also helps to control and optimize the process and guarantees high-quality end products. AIXTRON Crius 31x2 is a powerful and advanced reactor with a wide range of applications, and is ideal for industrial production of various materials such as OLED, semiconductors, solar cells and medical implants. It provides a reliable and efficient platform for the production of films with excellent uniformity and stability, enabling users to create quality products with high precision.