Used AIXTRON Crius 31x2" #9300899 for sale

AIXTRON Crius 31x2 is a edge-defined film-fed growth (EFG) reactor for the epitaxial deposition of semi-conductive materials. It is a high throughput, cost-effective deposition platform and is designed for production and research applications. AIXTRON Crius 31x2 reactor is equipped with a double-sided wafer loader, which can handle up to 150 mm (6 inch) wafer sizes, for improved wafer throughput. It can also handle up to eight wafers per side, enabling short cycle times. AIXTRON Crius 31x2 is equipped with a microwave assisted deposition (MWAD) equipment for plasma generation. This ensures a highly reactive, low energy, deep penetrating plasma field enabling high deposition rates and superior films. The efficient MWAD system enables AIXTRON Crius 31x2 to provide an efficient and cost-effective deposition process. It is capable of producing high quality epitaxial layers with good uniformity and excellent step coverage from quality substrates. The EFG source and substrate holder assemblies are designed for easy customization to meet specific customer demands. The source holders use RF antennas for optimized process parameters during deposition. The EFG source can be adjusted manually for precise processing and fine tuning. The substrate holders feature an eight-element, three-zone target assembly for uniform heating of the substrate. An exhaust unit with adjustable velocity provides optimal pressure conditions and controllable environment. AIXTRON powerful process control software provides a user-friendly interface for easy set-up and monitoring of the machine. The operator can adjust parameters such as gas flow rates, power levels, substrate temperature and atmospheric pressure. The tool provides real-time feedback for evaluating and optimizing the epitaxial deposition process. AIXTRON Crius 31x2 is a reliable and efficient deposition platform for producing advanced thin film structures. The efficient RF-enhanced deposition process enabled by this platform makes it an ideal and cost-effective solution for industrial and research applications. It is an efficient tool for producing high quality epitaxial films with uniformity and superb step coverage.