Used AIXTRON Crius 31x2" #9353179 for sale

AIXTRON Crius 31x2 is an advanced, production-ready, plasma enhanced chemical vapor deposition (PECVD) reactor specifically designed for the production of high performance semiconductors and optoelectronics. It offers processing flexibility and superior process control in a wide range of application areas such as optoelectronics, nanoelectronics, flat panel displays, solar cells, MEMs, and light emitting diodes (LEDs). This equipment offers a wide range of features designed to optimize process performance and enable superior ramp up to high volume production rates. The PECVD process in AIXTRON Crius 31x2 reactor is based on generating a plasma in a high vacuum. The plasma is used to heat the precursor gases which then react together and are deposited onto a substrate. This process can be used to deposit various types of materials such as oxides, nitrides, and metals at temperatures ranging from 25-500°C. The system is designed with an advanced real-time process control unit to ensure repeatable and reliable deposition processes. This allows for an optimized design of repeatable process steps and accurate process monitoring to achieve the desired deposition characteristics. AIXTRON Crius 31x2 reactor offers superior process flexibility with the ability to process substrates up to a diameter of 350mm. The machine utilizes an optimized, high reliability bell-type source of up to two gas sources, designed to minimize gas stocking requirements, and reduce downtime for large wafer production batches. AIXTRON Crius 31x2 is a production-ready tool which is easy to operate and requires minimal maintenance. The asset also offers a full parameter set and advanced process control features including real-time process feedback and data logging capabilities. AIXTRON Crius 31x2 has a built-in safety model designed to minimize accidental exposure to potentially hazardous materials. This includes multiple layers of safety, such as multiple safety interlocks, monitoring of hazardous parameters, and the possibility to shut down the equipment in case of emergency. The system also features very low vibration levels and low power consumption to minimize operating costs. In summary, AIXTRON Crius 31x2 is a high performance, production ready PECVD reactor designed to meet the needs of the optoelectronics and semiconductor industries. It offers advanced process control and a wide range of process capabilities in a reliable and safe package. AIXTRON Crius 31x2 is a cost-effective solution for high-volume production runs and offers maximum flexibility to accommodate a wide range of fabrication processes.