Used AIXTRON Crius 31x2" #9353182 for sale

AIXTRON Crius 31x2 is a highly advanced reactor designed for advanced Thin Film processing. It uses advanced technology to provide advanced performance, superior process control, and the highest quality results for a variety of applications. The Crius 31x2 utilizes the latest in MOCVD (Metal Organics Chemical Vapor Deposition) and oxidation technologies, allowing for unparalleled control of deposition rate, growth rate, layer thickness, and dopant concentration - for thin film applications. This makes it the ideal reactor for other advanced processes such as PECVD (Plasma Enhanced Chemical Vapor Deposition), ALD (Atomic Layer Deposition) and CVD (Chemical Vapor Deposition). AIXTRON Crius 31x2 reactor is a modular system, meaning that additional modules can be purchased to extend the overall size and number of processes possible. It provides a large number of configuration options, as well as having multiple independently controllable chambers for process flexibility and repeatability. With its ultra-fast deposition rate, the Crius 31x2 is able to achieve deposition rates of up to 28 nanometers per second, and its independent control chambers offer both temperature and pressure control. The Crius 31x2 also utilizes AIXTRON proprietary Plasma Enhanced Layer Mapping (PELM) technology, allowing for the placement of materials across the entire surface of the wafer with a uniform, precise pixel-level control. This technology enables the deposition of high-aspect ratio features, enabling technologies such as advanced MOSFET transistors, high performance memory devices, and more. The large chamber size and fast deposition rate of the Crius 31x2 also enable deposition of devices with 8-inch wafers. This makes the Crius 31x2 the perfect choice for the deposition of high-efficiency and highly functional electronic devices such as LEDs, solar cells, and display panels. Additionally, the Crius 31x2 also offers a wide range of accessory options, enabling it to meet any user's needs. This makes it an incredibly versatile system that can be used for a wide variety of applications. All in all, AIXTRON Crius 31x2 reactor is an advanced, feature-rich and reliable Thin Film processing system that is ideal for processing a wide array of applications. It offers superior process control, uniform deposition, large chamber size, and a wide range of options for customization - making it the perfect choice for both research and production.