Used AIXTRON Crius 31x2" #9364569 for sale

AIXTRON Crius 31x2"
Manufacturer
AIXTRON
Model
Crius 31x2"
ID: 9364569
Wafer Size: 2"-6"
MOCVD Systems, 2"-6".
AIXTRON Crius 31x2 is an advanced and reliable MBE® Reactor equipment specifically tailored to enable high-performance, cost-effective device fabrication. This reactor is designed to consistently produce a wide range of optoelectronic and nano-scale materials and components. The Crius 31x2 is equipped with a range of features to ensure efficient and successful production. It has a large wafer boat capacity of up to eight loads, allowing for faster production of larger breeds. The two-stage intermediate pressure vessels and adjustable turbo pumps enable dual-mode operation, facilitating the production of both thin- and thick-film devices. Additionally, the reactor's chrome inner chamber walls ensure superior purging efficiency and uniformity of system parameters, ensuring the highest possible yields. The Crius 31x2 offers the highest quality and process flexibility of any MBE reactor on the market. Its advanced temperature management unit ensures excellent thermal stability and allows for precise temperature control - with a temperature range of 200ºC to 1200ºC - to safely and accurately fabricate components down to the nanometer scale. The reactor is also designed to adhere to the highest safety standards. Its PLC-interlinked process control systems are coupled with sensors that measure current, voltage, and temperature to ensure safe operation. The Crius 31x2 also offers a range of versatility and expandability options, such as additional load locks, chambers, gases, feed units, and RF antennas for the ultimate in flexibility. Moreover, the reactor is engineered to be easily as well as quickly installed, with minimal ramp-up time. Upon installation, users can rely on software-integrated remote maintenance to observe, manage, and adjust parameters within the reactor machine. Overall, AIXTRON Crius 31x2 is designed to be a comprehensive and reliable MBE reactor tool. Its advanced features and versatile options make it an ideal choice for optoelectronic and nano-scale device production.
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