Used AIXTRON Crius 31x2" #9380259 for sale

AIXTRON Crius 31x2 is a metal organic chemical vapor deposition (MOCVD) reactor that is designed for research and development as well as manufacturing of compound semiconductors and optoelectronic devices. This type of MOCVD platform is designed for achieving precise control of the deposition and epitaxy of a variety of materials such as Group III-V semiconductors and II-VI semiconductors, as well as organic and inorganic material. AIXTRON Crius 31x2 features a two-zone vertical process tube, a two-zone susceptor, and a temperature control system that is precise up to 0.01° C. It has an automated process controller which allows precise control of temperature, pressure, and process parameters. It also includes a touch-screen display that allows a user to monitor and adjust different process parameters in real-time. AIXTRON Crius 31x2 is also equipped with thermal process sensors that can be used to monitor the process inside the reactor. AIXTRON Crius 31x2 has a deposition rate of up to 10µm/hr and is capable of producing layers with thicknesses as low as 10nm. It is also capable of producing compounds with uniform doping, low roughness, and high resistivity. Its custom designed reaction chamber, designed to allow for precise process control, provides a stable environment for sample deposition. AIXTRON Crius 31x2 is equipped with an advanced programmable process chamber and advanced material sources which allow for efficient and accurate control of the growth of materials. These sources provide precise control of the temperature, pressure and source-to-substrate ratios. AIXTRON Crius 31x2 can also be used in conjunction with other aids, such as gas supplies and shadow masks, for particular applications. AIXTRON Crius 31x2 is designed to provide maximum user safety and process compatibility during deposition. Its electronic systems are designed to prevent incorrect operation and potential mis-operation due to improper wiring. Additionally, its automated processes are designed to ensure reproducibility for each process run, enabling repeatable processes. AIXTRON Crius 31x2 is a versatile, advanced MOCVD platform for research and development, enabling the precise and reproducible deposition of a variety of materials. Its custom designed reaction chamber, precise control of process parameters, and advanced material sources provide a high degree of control over the deposition and epitaxy of compounds, optoelectronic devices, and other material systems.