Used AIXTRON Crius I #293661393 for sale

AIXTRON Crius I is a a deposition reactor designed for use in high-throughput processing of thin film coatings. It features a large reaction chamber that can process up to 35 cm^2 wafers and offers a large operating range of up to 1500°C. Crius I includes an array of advanced features that enable precise control over the deposition process. It has an efficient gas flow equipment and low background pressure for improved deposition quality. In addition, it features an on-board gas preparation unit to facilitate the use of reactive gas mixtures. The system also includes AIXTRON unique AutoFeedTM automatic wafer handling unit that can be used to automatically transfer up to twenty wafers into the chamber without opening the reactor door. The reaction chamber of AIXTRON Crius I is equipped with an advanced element controller that provides precise control of temperature, micro-pressure, gas flow, and RF-power. It also features a highly efficient, direct-heated, ceramic-coated, hot-wall susceptor design. This enables a fast response of the hot-wall for efficient deposition growth at high temperatures. In addition, Crius I includes a horizontal showerhead that ensures uniform deposition over the whole wafer surface. AIXTRON Crius I is available in several configurations that vary in chamber size, process temperature, and substrate handling. The machine has also been designed to be compatible with a wide variety of materials. This makes it suitable for a wide range of thin-film deposition processes, including oxide, nitride, and silicon-germanium deposition. Furthermore, the powerful control tool and its integrated safety features ensure safe and reliable operation and process repeatability. Overall, Crius I is a powerful deposition reactor that offers numerous advanced features and powerful control of the deposition process - all of which make it an ideal solution for high-throughput thin film deposition applications.