Used AIXTRON Crius I #293678425 for sale

AIXTRON Crius I is a reactor for research and production of nanostructured materials designed by AIXTRON. It is a plasma-based, physical vapor deposition (PVD) equipment that uses inductively coupled plasma (ICP) to finely control the plasma density at the substrate level for optimum adhesion and material properties. Crius I has an innovative, modular design that allows for increased flexibility and scaling. It is suited for applications ranging from small-scale product prototyping to high-volume production of nanostructured materials. It has an open architecture that allows it to be upgraded and expanded with additional hardware components. AIXTRON Crius I also supports multiple ICP channels with up to 16 independently adjustable power supplies. It also features an advanced monitoring and control system which enables the optimization of the process parameters for increased accuracy and quality. Crius I supports a wide variety of nanostructured material production including nanotubes, nanoparticle-based thin films, and nanostructured meshes with tunable properties. With this reactor, nanotechnology materials can be produced with high accuracy, reproducibility, and efficiency. The process parameters have been designed to enable the production of a large variety of nanostructured materials with precise control over the crystallinity and characteristics of the material. AIXTRON Crius I also supports a wide range of deposition techniques such as evaporation, sputtering, and ion beam deposition. Crius I is capable of producing a broad range of high-performance nanostructured materials with very high yields. Its advanced precursor control unit accurately monitors the flow of precursor materials and adjusts it as needed. This helps ensure that the deposition process is consistent and that the final product has the desired properties. The reactor also has an integrated safety machine that ensures that all processes are safe and reliable. In summary, AIXTRON Crius I is a versatile and powerful PVD reactor for nanomaterial research and production. It offers precise control, advanced monitoring, and high yields for a comprehensive range of nanomaterials. Its innovative design and features make it an excellent tool for any laboratory or production environment.