Used AIXTRON Crius I #9065475 for sale

AIXTRON Crius I is a commercial-scale, inductively-coupled plasma (ICP) reactor. This reactor offers the best in class performance in substrate uniformity and high etch rates, making it an ideal choice for upscaling production. Its compact footprint and low total cost of ownership make it highly configurable for a range of application specific needs. Crius I has a simple, modular construction. The cylindrically-shaped chamber and end ring are made of stainless steel and have a water cooling jacket which enables a stable operational temperature of up to 1000°C. The substrate holder is made from graphite and has a flat area to accommodate large, substrates of up to 100mm diameter. An RF generator powers the induction coils of the reactor to produce the necessary ICP plasmas and is connected to a controller to ensure precise control of plasma parameters. AIXTRON Crius I employs high-speed, digital technology to enable highly uniform plasma deposition. Its advanced Showerhead RF Bias Control allows for the uniform deposition of various species onto the substrate for optimal processes. It also features a high-speed End Ring RF Bias Control to ensure uniform distribution of the metal species along the chamber walls, leading to improved etch uniformity. Crius I also offers a wide range of safety features such as a flame arrestor that prevents the flame from propagating to other components, and an integrated spark detection and control unit. It has a simple yet reliable construction which is designed to operate continuously for long periods at high temperatures, making it ideal for high-yield, high-volume operations. Overall, AIXTRON Crius I is an advanced, commercial-scale ICP reactor that offers an unparalleled performance, compact footprint and low total cost of ownership. It is an ideal choice for upscaling production and maximizing yields in high-volume applications.