Used AIXTRON Crius I #9065476 for sale

AIXTRON Crius I is a chemical vapor deposition (CVD) etching reactor designed for a wide range of industrial and academic R&D applications. This innovative reactor supports processes such as epitaxy, polycrystalline silicon deposition, refractory metal deposition, and doping of thin films. Crius I consists of a quartz process chamber, an RF generator, an in-situ gas delivery equipment, a vacuum pumping system, and an advanced CVI controller. The quartz chamber of AIXTRON Crius I has been designed for maximum process flexibility. The interior of the chamber is equipped with quartz chamber shields, which are designed to minimize contamination and optimize uniformity of the entire process. The design of the chamber ensures uniform gas distribution and thermal uniformity. Furthermore, the chamber shields reduce evaporant condensation, thus increasing process reliability and repeatability. The RF generator is designed to provide an adjustable RF power source within the chamber. This helps in controlling process parameters, such as deposition rate, substrate temperature, and gas composition. The generator is equipped with automatic ARCON (automatic ramp controlled output) settings, an optimizer, a soft start, and an RF power output monitor. The combination of these elements provides great flexibility in optimizing and controlling the process. Crius I is equipped with an advanced in-situ gas delivery unit. This machine consists of four independent valve blocks, each with its own pressure transducer, which makes for fast and easy initialization and adjustment of the process. The gas delivery tool allows for precised control of required gas inputs, such as Ar, N2, O2, H2, SiH4, PH3, D2, and many other processing gases. AIXTRON Crius I is also equipped with a vacuum pumping asset which features an integrated ion getter variable frequency drive (VFD) based design. This allows for fast pump-down times and greater overall efficiency when compared to mechanical pumps. Crius I's advanced CVI controller has been designed to automate and integrate the whole model, giving users the ability to monitor and control numerous parameters associated with the process. This makes for fast start-up times and more consistent process results. In conclusion, AIXTRON Crius I is an advanced, high-performance etching reactor that provides superior process flexibility and reliability. The combination of its quartz process chamber, RF generator, gas delivery equipment, vacuum pumping system, and CVI controller makes for an efficient, cost-effective etching solution for a wide variety of industrial and R&D applications.