Used AIXTRON Crius II X-L vu #9408188 for sale

Manufacturer
AIXTRON
Model
Crius II X-L vu
ID: 9408188
MOCVD Systems Gases: N2 H2 NH3 SiH4 MO Baths: LAUDA RM6 for C10H10mg LAUDA RM6: 2-Storage (CH3)3Ga (C2H5)3Ga (CH3)3Al (CH3)3In.
AIXTRON Crius II X-L vu is a state-of-the-art chemical vapor deposition (CVD) reactor designed for the growth of large-scale graphene structures. It features a recessed susceptor design with a variable shallow chamber height which allows for precise control of the thickness and alignment of the graphene layers. Crius II X-L vu also includes a CVD Cleaning Equipment (CCS), which cleans deposited carbon off of the wafer for better material quality and fewer impurities. Additionally, the system includes a high-precision wafer heater, which ensures uniform and homogenous heating for improved thermal control in the growth process. AIXTRON Crius II X-L vu is an advanced CVD reactor that is well-suited for high throughput and repeatable growth of large area graphene layers. The unit is controlled via a proprietary graphical user interface (GUI) that allows for full parameterization of each step in the growth process. This includes parameters such as temperature, pressure, and flow rate, and allows for full optimization of the process. Crius II X-L vu also includes a load-lock machine enabling rapid wafer loading and unloading. AIXTRON Crius II X-L vu provides excellent growth conditions, with adjustable temperatures up to 1150 °C, and adjustable pressure up to 100 Torr. This allows for fine-tuning of the growth parameters to precisely control the thickness, alignment, size and number of layers grown. Crius II X-L vu is also capable of producing high-quality continuous graphene layers with excellent electrical properties. The tool includes a full suite of independent temperature controllers for temperature control in each zone, as well as a unique dual-side chamber design, offering considerable overall asset efficiency. All of these features make AIXTRON Crius II X-L vu an excellent tool for large-scale graphene growth. Its advanced design, high-precision wafer heater and adjustable temperature, pressure and flow rate make Crius II X-L vu the perfect tool for researchers and industry engineers looking to study and produce high-quality graphene layers.
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