Used AIXTRON Crius II #293587244 for sale

AIXTRON Crius II is a horizontally-mounted, large-area deposition equipment that utilizes a two-chamber process technology, resulting in improved process uniformity, throughput and accurate process control. This horizontal deposition process is ideal for Controlled Ambient Process (CAP). Crius II design is based on the 32" substrate wafer size, which can handle applications up to the 300mm wafer size. With its compact design and small footprint of 1.7m x 1.5m, AIXTRON Crius II process chamber is 6.5 cubic meters in volume, allowing for a generous control space when fitting reactors and process components inside the chamber. Crius II process chamber contains a number of components including three high-power RF sources, a magnetron sputtering source, an ion source, and high-temperature diffusion sources. Two RF sources are used for deposition and two for etching. AIXTRON Crius II is capable of enabling deposition utilizing magnetron sputtering, remote plasma, thermal sources, and high-temperature reactors. The chamber is temperature-regulated to the desired process temperature and features two separate gas supplies for each process chamber. The two-stage gas controller independently controls the gas levels, pressure, and flow to the process chambers. This advanced control system provides a wide range of process parameters to optimize the process and target wafer quality. The advanced control unit utilized by Crius II also allows for automated and manual control of the process parameters including source mask placement, pressure, substrate speed, and temperature. The substrate is rotated inside the chamber using an in-situ rotary table, allowing for even and uniform deposition and etching. The advanced control machine of AIXTRON Crius II also makes it compatible with multiple chamber cooling options, allowing the user to tailor cooling solutions to the individual process requirements. Crius II process chamber chamber is designed to handle a wide range of hazardous materials, including Group B and C gases. Finally, AIXTRON Crius II chamber offers a variety of online diagnostic tools including in-situ imaging, optical emission spectroscopy, quartz crystal microbalance, and a number of other diagnostic evaluations. These tools enable users to identify potential sources of contamination, oxide films, particle deposition, and monitor film uniformity.