Used AIXTRON Crius II #293591984 for sale

AIXTRON Crius II
Manufacturer
AIXTRON
Model
Crius II
ID: 293591984
MOCVD System GaN.
AIXTRON Crius II is an upgraded production version of the Crius Low Pressure CVD (LPCVD) equipment developed by AIXTRON. Crius II is a multi-wafer reactor, characterized by its ability to provide a superior conformal, uniform, and repeatable deposition of precursors onto a variety of wafer substrates. Precursor material is sealed and then conveyed into a CVD chamber, where the deposit is formed at lower pressures (1-200 mbar) and low temperatures (200-600 °C). AIXTRON Crius II is a reliable, cost-effective solution for a range of research applications. Its small chamber design minimizes thermal loads, providing maximum uniformity and repeatability of deposits. The low-pressure environment prevents radicals from affecting the quality of the resulting deposition. Hence, Crius II enables consistent thickness variations as low as 0.5 nm. Additionally, with its wide range of temperature and pressure combinations, the reactor can handle a variety of different material growths efficiently - including the deposition of semiconductor and magnetic materials. Along with the inherent precision of AIXTRON Crius II, the chamber has been further equipped with AIXTRON 'ReadyPLUS' control system. This includes a unique chamber geometry design, with enhanced enclosure layers, automatic and manual zone control, improved cooling and heating systems to enable temperature uniformity, and an adjustable gas flow monitoring unit. Furthermore, in order to achieve process flexibility, Crius II is able to utilize 'sequential deposition' and 'Sequence flow control' algorithms to enable the deposition of multiple layers of different materials in one chamber. This pioneering control machine also offers features such as automated hydrocarbon removal, route-dependent recipe management, and preventive maintenance functions. In summary, AIXTRON Crius II is an advanced LPCVD tool equipped to handle a wide range of material deposition applications. With its accurate and repeatable deposition capabilities and its sophisticated control asset, Crius II is an ideal choice for researchers in the field of semiconductor and magnetic depositions.
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