Used AIXTRON Crius II #293607523 for sale

AIXTRON Crius II is a reactor from the company AIXTRON, specifically designed for research and development of advanced semiconductors and LEDs. Crius II is a sequence of three modules- Dual-Substrate MOCVD, Single Wafer Showerhead and the Gleeble Simulator, that allows the user to make accurate measurements of their growth and deposition methods. The Dual Substrate MOCVD reactor is a equipment that allows the user to take advantage of molecular beam epitaxy (MBE) and metal organic chemical vapor deposition (MOCVD). The system uses a programmable valve and a series of vacuum pumps to create a higher growth rate, reduce costs and increase efficiency. This reactor is capable of epitaxial growth in three ways: MBE, MOCVD and autoclave-assisted epitaxial growth. The reactor can also be configured for up to eight sources for mono-layer, multi-layer and 3D structures. The Single Wafer Showerhead allows the user to deposit high-quality layers of material at the wafer level, with a minimum of downtime between wi40afer updates and substrate changes. The patented rotating disc allows for uniform deposits throughout the wafer without manual intervention. The Gleeble Simulator also offers users the ability to simulate temperature profiles and thermal processes, with the added benefit of automatic shut-off of anomalous processes. The simulator comes equipped with a pressure unit which allows the user to control the processing atmosphere and monitoring of events within the machine. AIXTRON Crius II platform is a versatile and powerful tool for the development of advanced semiconductors and LEDs. It has become the standard tool within the semiconductor industry and is used in a wide range of research, development and production applications. The reactor is reliable and cost-effective, as well as offering users a high level of flexibility.