Used AIXTRON Crius II #293627743 for sale

AIXTRON Crius II is a high-performance, solid-source deposition system designed for thin-film deposition of metals and dielectric materials. It is the most advanced version of AIXTRON Crius series and is widely viewed as a game-changer in the production of nanomaterials. Crius II combines high throughput, reproducibility, and reliability for the production of thin films for optical and electronic applications. The system consists of two modular sources, a source control unit, and a source vessel, all with independently controlled thermal conditions. Substrates can be up to 200mm in dimension and can be placed on the heated stages that can reach up to 1000°C. A variety of removable deposition sources are available, including magnetron and crucible sources, allowing for a wide range of thin-film formation processes. AIXTRON Crius II is capable of producing thin films with a uniform thickness and excellent characteristics, while also offering a high deposition rate of up to 400nm/min. The system has the ability to deliver metal oxide films with good stoichiometry and reduced defect density, as well as metal films with superior surface roughness and excellent macro-morphology. It has also been designed with a high throughput capability and optimized for large-scale production of thin films and nanostructured materials. Crius II allows for process control through an intuitive graphical user interface and has pre-installed recipes for a wide range of thin-film materials, enabling automated process control. It also features advanced safety features and temperature monitoring systems. AIXTRON Crius II is an ideal choice for the production of high-performance thin films, with the capacity to produce thin films with improved uniformity and superior characteristics. With its wide range of removable sources, high deposition rate and easy process control, Crius II is a valuable tool for many nanomaterials production.