Used AIXTRON Crius II #293831257 for sale

AIXTRON Crius II is a chemical vapor deposition reactor (CVD) used for thin film deposition and semiconductor processing. It is specifically designed to provide high-quality films for advanced materials research and device fabrication. The reactor is a single-wafer atmospheric pressure equipment that supports up to two wafers at time. It offers a low pressure of 0.7 to 2 Torr and high temperature range of 50 to 500°C. Crius II is made up of several modules and components. The two primary modules are the load-lock system and the main chamber. The load-lock unit holds the wafers and provides protection during the deposition process. The main chamber is a circular chamber that protects the wafers from gases and pressure. It also prevents outside contamination and maintains the optimal deposition environment. AIXTRON Crius II also includes a wafer transport machine, which transports wafers into and out of the chamber. The wafers transfer tool is equipped with a conveyor belt and pushers that move the wafers within the chamber. Crius II is powered by a computer asset, which controls the pressure and temperature of the model, as well as the flow of the reactants and the timing of the deposition process. It allows the user to adjust the parameters such as the temperature and pressure to meet their specific requirements. AIXTRON Crius II also features an automation equipment, which allows users to program settings. This automation system helps reduce the complexity of the deposition process, making it more efficient. Crius II's advanced design is also designed for efficient and fast deposition. It is equipped with advanced deposition technology, which ensures that films are accurately and consistently deposited. It supports several deposition technologies and has an advanced pre-deposition chamber, which prepares the wafers for deposition. This ensures uniform chemical deposition in the main chamber, resulting in high-quality films. AIXTRON Crius II has also been designed to be user-friendly. It offers a large colour touch-screen display, which allows users to intuitively control the unit from the front side. The on-screen menu makes controlling the unit and setting up deposition runs easier. In conclusion, Crius II is an advanced CVD machine which provides high-quality films for advanced materials research and device fabrication. It is designed for efficient and fast deposition, and its user-friendly interface makes it easier to use. With its advanced pre-deposition chamber, advanced deposition technology, and automated programming tool, it is an excellent choice for thin film deposition.