Used AIXTRON Crius II #9375373 for sale

AIXTRON Crius II is a next-generation flexible chemical vapor deposition (CVD) reactor. It is designed for the deposition of high-quality thin films in a wide range of applications. The system is equipped with unique features to incorporate and use the power of AIXTRON Digital Process Control (DPC) for precise process control. Crius II reactor utilizes the patent-pending filtration systems and the electronics combination of AIXTRON Inverse Magnetron source technology to monitor process temperature and deposition rate. AIXTRON Crius II can be used for deposition of all types of films for applications such as MEMS, photonic crystals, III-V optoelectronic semiconductors, flat-panel display, and solar cell technologies, among many others. Crius II reactor is designed with an Intelligent Process Control (IPC) system, which is powered by a controller with latest process monitoring and control algorithms. This IPC is equipped with a unique multi-point data acquisition option, designed to monitor the full development status of the thin film during deposition process. This results in better quality films with improved uniformity, controllability and repeatability. The controller can also be used to optimize the deposition process, eliminating the need for manual control. AIXTRON Crius II reactor is capable of performing temperature- and pressure-sensitive deposition processes and is equipped with a unique cooling system technology (AirFlex) to ensure high accuracy and high controllability of temperature and pressure. Crius II truly allows for a wide range of applications due to its great versatility. AIXTRON Crius II is a noble and advanced reactor derived from AIXTRON Crius series of CVD products that have made it a leading provider of deposition solutions for industry applications. Crius II is compatible with a range of AIXTRON source technologies such as Schottky cells, Langmuir-Blodgett, hot-wire chemical vapor deposition (HW-CVD), and NanoWELL. AIXTRON Crius II is the ultimate reactor for advanced CVD deposition. Its features make it possible to produce high level thin-films with finer details and faster cycle times compared to conventional deposition methods. With Crius II, users are guaranteed excellence in terms of productivity, quality and significant cost savings.