Used AIXTRON Crius II #9402490 for sale

AIXTRON Crius II reactor is a high-precision, table-top deposition tool used for Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD). It is predominantly used for thin-film deposition applications. It is designed for the reliable, precise and repeatable formation of a variety of critical interface layers and thin films in a wide array of technologies such as microelectronics, optoelectronics, magnetic storage, energy storage and biomedical. Crius II is a fully automated system and offers precise, repeatable process control. AIXTRON Crius II is based on a field-proven modular design that enables easy integration of different deposition modules. It also includes a wide range of advanced features such as sample rotation and horizontal substrate support, pre-evaporation and sample heating, a motorized shutter, and a Co-Deposition options for co-deposition of sources at the same time for complex layer deposition processes.. The deposition module of Crius II is equipped with a Moseley source holder that allows single or multiple Substrate Source configurations and source-mediated co-deposition of multiple precursors or reactants. The Moseley source holder is designed with a rocking motion that assists in the uniformity of the deposition and homogeneity of the film. AIXTRON Crius II also includes a high-precision sample heater, a shutter and a heated shutter set up. The sample heater is a vacuum-sealed, cavity-back design. It provides rapid sample temperature control and precise, repeatable temperatures. The heated shutter allows for field-free, accurate concurrent deposition and co-deposition, and temperature control for substrate to backside evaporation. Crius II is a powerful tool for the deposition of nanolayered thin films. It enables precise, repeatable coatings, resulting in experimentally validated structures with precisely determined phase and interface boundaries. AIXTRON Crius II is capable of wide-ranging parameter tuning for optimal process control for a variety of deposition processes. It is a powerful, exhaustive tool for use in research, development and production applications.