Used AIXTRON Crius #9222205 for sale

AIXTRON Crius is an advanced plasma-enhanced chemical vapor deposition (PECVD) system. It is specifically designed to support a broad range of applications in the development and production of optical, electronic and medical products. It is highly versatile and can work with a wide range of substrates such as glass, plastics, metals and ceramics. Crius reactor utilizes an advanced and innovative inductively-coupled plasma (ICP) source to efficiently create a high-density glow discharge. This glow discharge enables precise control over film composition, deposition process parameters, and film uniformity. The ICP component of the reactor combines high power densities with a "soft start" feature, which minimizes dust and contamination during operation. The reactor also features a temperature-controlled "cold wall" chamber, which helps to reduce noise and achieve uniform film deposition conditions. AIXTRON Crius reactor can be used to deposit a broad range of thin films, including those containing nitrides, oxides, metals, and more exotic materials such as carbon nanotubes and graphene. It is able to deposit these materials in a wide range of thicknesses and provides excellent uniformity and repeatability. It also employs advanced recipe control technology, automating the entire deposition process and eliminating the need for manual intervention. Crius reactor is suitable for thin-film deposition processes used in semiconductor device fabrication and also for optoelectronic device manufacturing. Its versatile design and ability to create high-quality thin films make it an attractive choice for industrial and research applications. It is well-suited for both prototype and large-scale industrial production, and it features a variety of features that make it easy to install, maintain, and manage. Overall, AIXTRON Crius is an exceptional reactor capable of creating high-quality, uniform films for a wide range of applications. Its advanced ICP plasma source enables precise control over the deposition process, while its "cold wall" chamber helps reduce noise. Its user-friendly features, such as automated recipe control capabilities, make it a great choice for industrial production or research applications.