Used AIXTRON G3 2600 #9111425 for sale

AIXTRON G3 2600 is an advanced Hot-Wall Chemical Vapor Deposition (HWCVD) reactor designed for the production of nanostructures and nanocomposite thin films. This advanced CVD reactor has a modular design that allows for the control of multiple deposition parameters, including gas flowrates, pressure, temperature, and others. It is also equipped with a quartz process tube and a high-power RF (Radio Frequency) generator to allow for atomic species manipulation. G3 2600 is capable of depositing materials with precision down to the nanometer scale and is able to produce high-quality thin films. Its modular design allows for the control and adjustment of deposition parameters such as gas flowrates, pressure, temperature, and others, thus ensuring accuracy and reproducibility. Moreover, the device is designed so that different deposition recipes can be stored in its computer system, thus allowing for the quick and efficient production of thin films. Furthermore, AIXTRON G3 2600 offers several advanced features including its interiors being made of quartz-protected stainless steel, a user-friendly touchscreen control panel, an ergonomic design, and cleanroom compatible parts. In addition, G3 2600 also features a high-power RF generator (up to 76 MHz) and a heated quartz process tube, both of which enable the precise control of the growing films. This advanced design makes the reactor particularly suitable for the deposition of quantum materials and nanocomposite films. Thanks to the high-power RF generator, users can manipulate atomic and ionic species within the process tube, allowing them to precisely control the deposition rate and the composition of their films. To sum up, AIXTRON G3 2600 is an advanced CVD reactor designed to produce nanostructures and nanocomposite thin films with precision and accuracy. Its modular design, ergonomic features, and advanced features such as its RF generator and quartz process tube make it an excellent choice for a wide range of applications.