Used AIXTRON G3 #9187985 for sale

AIXTRON G3 is a model of reactor developed by AIXTRON, a Kiel-based German company. It is a metal organic chemical vapor deposition (MOCVD) reactor used for growing gallium arsenide (GaAs) based materials for III-V compound semiconductor applications. AIXTRON G 3 is capable of achieving high quality epitaxy and uniformity, which allows for the production of opto-electronic components such as lasers, light-emitting diodes (LEDs), and photodetectors. G3 is designed with several safety and efficiency features that help ensure reliable operation. First, G 3 has a "Bake-in" equipment for cabin and gas flow optimization that prevents epitaxial film formation problems. Second, a single-stage VAR shutter prevents unwanted etch species invasion. Third, the injection power generator prevents over-erosion of conducting surfaces and allows for optimal substrate temperature during growth. Lastly, a safety shutter can be used to prevent contaminants from entering the reaction chamber. AIXTRON G3 also features a side entrance inlet system that minimizes the risk of particles entering the growth chamber. Additionally, its quartz window allows for easy observation during the growth process. Features such as automatic gate control, chamber over-pressure protection, and a streamlined substrate transfer robot help ensure optimal processes and reduce risk of problems. AIXTRON G 3 uses a pressure-balance control unit to regulate temperature, enabling tight control of growth rate, layer thickness and phase. This helps to ensure uniformity and repeatable layer growth. An active cooling machine helps maintain the precise temperature needed for epitaxy. Additionally, a new nozzle design allows for even growth and improves the homogeneity of the film. G3 is designed for easy maintenance and reliable operation over many years. The robust modular design allows easy single replacement of any part and helps minimize downtime. G 3 is equipped with an exhaust tool that enables gas oxidation and post-process cleaning. It also has a robust contact cooling asset and quartz glass seal to ensure a secure and leak-free connection to the substrate. AIXTRON G3 is an efficient and reliable reactor solution for various III-V compound semiconductor materials. Its combination of safety features, substrates transfer robot, control model, and advanced cooling equipment ensures tight process control and reliable operation. Its uniformly high quality and low defect products make it suitable for diverse, high-yield semiconductor production applications.