Used AIXTRON G4-TM #293636228 for sale

AIXTRON G4-TM is a fourth-generation reactor designed and manufactured by AIXTRON for industrial-scale deposition of thin films for materials such as amorphous, polycrystalline and microcrystalline thin films. AIXTRON G 4 TM is a state-of-the-art reactor featuring a unique, in-situ stopping power sensor that adjusts power supplied to the target in real time. This ensures accurate and reliable process control throughout the deposition process. The reactor is designed to provide versatile and high-throughput thin-film deposition at industrial process levels. It offers a wide range of substrate sizes, material uniformity and deposition rates, as well as excellent uniformity of thin-film characteristics such as composition, optical and electrical properties. Its compact design and excellent control features enable high-throughput, cost-effective deposition in the production of thin-film coatings. G4-TM offers several advanced features that make it an ideal choice for thin-film deposition. These include an energy monitoring system to track and monitor deposition energy, enabling uniform thin-film parameters and preventing defects such as cut-off edges, peeling, cracking and discoloration. The use of higher deposition pressure for faster deposition and improved uniformity. Improved automation to reduce labor and consumables costs, as well as lower the maintenance cost compared to other reactors. The reactor is powered by a high-power RF generator specifically designed for G 4 TM depositions. This generator provides accurate and uniform power for 200 to 1,000 Watts - enabling thin-film depositions of various materials and alloys with various operation modes. AIXTRON G4-TM offers excellent process control, customizable parameters and automated operation. The in-situ stopping power sensor is capable of automatically adjusting the target power to ensure accurate, reliable and cost-effective deposition throughout the process. Its short reaction time and high accuracy ensure repeatable thin-film deposition results and excellent uniformity not achievable with other deposition systems. Additionally, AIXTRON G 4 TM reactor is designed to be flexible and easy to integrate into factory systems. It is available in both single-chamber and dual-chamber models to accommodate different application needs. The system is compatible with various gases, materials and hardware for more efficient deposition process. Overall, G4-TM is an advanced industrial-scale thin-film deposition reactor that offers improved thin-film uniformity, process repeatability and cost-effectiveness. With its advanced features and versatile configurations, it can be used to produce a wide variety of thin-film coatings that meet the highest standards of quality.