Used AIXTRON G4-TM #9364578 for sale

AIXTRON G4-TM is a high vacuum reactor designed for applications such as chemical vapor deposition (CVD), atomic layer deposition (ALD) or molecular beam epitaxy (MBE). AIXTRON G 4 TM is designed for optimal growth of diamond, oxide and other semiconductor material, and is is based on AIXTRON tried and tested hot-wall CVD technology. The chamber of the reactor is constructed in a compact size of only 1 x 0.4 meter in order to reduce the installation footprint. The twofold split tube design is capable of achieving uniform thermal and power distributions while adjusting the injection angle of the effluent reactants. The substrate is heated from below and the gas distribution is through a injector system with changeable manifold of injector ports on the bottom of the chamber. For process control and ease of use of G4-TM, it is equipped with an intuitive graphical user interface, displaying virtual processes and graphical procedures. G 4 TM is capable of producing diamond crystallites of up to 5.5 Boron Nitride (BN) monolayers as well as Group III nitride layers, including GaN, AlN and InN. AIXTRON G4-TM is also equipped with a built-in pressure monitor and background pressure control system. The pressure can be reduced to a base pressure of 5 x 10-8 mbar, allowing for higher quality and reproducible growth cycles. In order to maximize the output of AIXTRON G 4 TM, it also incorporates two independent temperature controls for the substrate and injector. This allows for precise temperature control in order to achieve the desired process results. In terms of safety, G4-TM is hermetically sealed and it complies with the safety standards, such as CE Marking, ATEX 94/9/EC, NFС990H2 and UL Class 1 Division 1. The reactor is also designed with an ignitable safety atmosphere and overload protection, making it extremely safe to use for laboratory and commercial applications in the nanotech industry. Overall, G 4 TM is a highly reliable and advanced CVD / ALD / MBE reactor, capable of producing high quality diamond, oxide and other semiconductor materials. Itsintuitive graphical user interface makes it easy and safe to use, and its built-in safety features make it a suitable tool for laboratory and commercial applications in the nanotech industry.