Used AIXTRON G4 #9181339 for sale

AIXTRON G4 is an automated and versatile production-level MOCVD reactor that enables efficient and reliable production of optoelectronic devices for a wide range of applications. AIXTRON G 4 is designed to perform epitaxial growth processes with high accuracy, precision, and repeatability. The reactor features a powerful motor to provide high-speed, continuous motion required for precise growth processes. The reactor also includes an inductively heated quartz cold wall and tungsten halogen lamps for producing uniform thermal heating across the process chamber. G4 utilizes an advanced recipe editor which gives users full flexibility over their growth processes. This software enables users to configure and accurately control gas flows, oven temperatures, gas cut-off, and timing of deposition steps. The software also offers advanced safety features, such as a quantity-based shut-off, to prevent over-deposition and gas mixture problems. Additionally, G 4 features temperature feedback control with local temperature sensors which ensure accurate control of growth parameters during the entire process. AIXTRON G4 is configured with a process chamber of 25 cm in diameter with a 6 cm growth surface. AIXTRON G 4 reactor offers a robust design for easy maintenance and cleaning for long-term experiments. The equipment also provides a vacuum remote view system that allows users to inspect the substrate's position and growth results without having to open the unit. This helps to improve production efficiency and safety. G4 is designed to facilitate growth of III-V materials, such as aluminum gallium arsenide (AlGaAs) active layers, multi-layer structures, and other compound semiconductor materials. It is particularly suitable for the fabrication of high performance optoelectronic devices such as lasers and photodetectors. Since the machine is designed to easily interconnect other process chambers for inline production, it is suitable for mass production of devices at an affordable cost.