Used AIXTRON G4 #9206743 for sale

AIXTRON G4 is a vertical chemical vapor deposition (CVD) reactor designed for epitaxial growth of thin-film materials. Achieving a reliable, repeatable and controllable CVD process is enabled by the unique, process optimization ready platform. Trusted by many leading research laboratories and industrial centers worldwide, it delivers the highest precision and yields the best performance. AIXTRON G 4's reactor has a slim vertical design, allowing for a large growth space and optimal surface temperature balance. The reactor chamber is heavily insulated to avoid heat radiation, thus ensuring a full and uniform temperature distribution at the substrates. This can result in a homogeneous layer structure and improved layer quality. G4 has a wide range of features that are geared towards maximizing uniformity and repeatability. For example, it features a refined gas flow system, which helps maintain uniform mass transport in the deposition chamber. It also has configurable process parameters, such as heat-up rate and deposition temperature, which can be precisely tuned. Furthermore, G 4 is equipped with excellent vacuum tightness, ensuring a clean and efficient film growth process. AIXTRON G4 is also a powerful tool for research and development. It offers the accuracy and flexibility needed to modify and analyze processing parameters, such as gas composition, substrate temperature, process rate, application pressure and more. This allows for rapid tuning and optimization of processes and materials. This, in turn, spurs creativity and helps accelerate the development of new process technologies and materials. AIXTRON G 4 has exceptional deposition characteristics that can lead to extremely uniform and repeatable deposition. The uniform layer structure, together with the adjustable process parameters, allows for tremendous flexibility in production. This facilitates the development of highly optimized structures for a broad range of optoelectronic, functional, and structural properties. Overall, G4 is a powerful, user-friendly system for uniform, repeatable, and reproducible CVD deposition. Its accuracy and flexibility, coupled with the capability to precisely analyze process parameters, makes it an invaluable tool for any researcher or engineer looking to achieve reproducible results. G 4's robust design and accurate performance have earned it a place among the most sought-after CVD systems in the world.