Used AIXTRON G4 #9222127 for sale

AIXTRON G4 is a revolutionary reactor equipment designed for production of silicon-containing materials. It offers superior performance, enabling the production of both advanced thin-film materials and nanostructures on a high-volume scale. It features the latest in dopant technology to enhance the growth of many materials, including the ability to incorporate elements such as Aluminum, Gallium and Arsenic (AlGaAs). The reactor system is composed of a process chamber, an RF generator, a gas delivery unit and an integrated deposition monitoring machine. The chamber is a fully computerized enclosure designed to enable repeatable, automated process control. It is optimized for low temperature processes, making it possible to produce high-quality thin-films on substrates with a wide range of different process requirements. The RF generator is capable of providing up to 100 W of RF power with a frequency range of from 6 kHz to 40 MHz. This power can be precisely tuned to meet specific gas process requirements. It also provides excellent safety features, such as over-temperature protection and arc fault detection. The gas delivery tool consists of a number of individually-controlled dispensing outlets. This asset allows for precise control of materials deposition rates and yields, including the ability to avoid over- or under-coating at the exact desired thickness. In addition, this model offers the flexibility to use a variety of gases depending on the process requirements. Finally, AIXTRON G 4 features an integrated deposition monitoring equipment. This system consists of optical emission spectroscopy (OES), thin-film thickness measuring devices and online quality control. Combining these three components gives G4 the ability to directly monitor deposition processes in situ, providing process feedback in real-time and immediately alerting operators of any issues. All in all, G 4 is a revolutionary reactor unit designed to provide a wide range of material growth capabilities. Its combination of innovative features, high precision control and extensive monitoring capabilities make it the perfect choice for producing advanced materials and nanostructures on a high-volume scale.