Used AIXTRON G4 #9250875 for sale

AIXTRON G4 is a highly advanced metal-organic chemical vapor deposition (MOCVD) equipment. It is a high-speed reactor capable of conducting a variety of materials deposition processes, such as single and multi-layer films of Group III-V semiconductors, oxides and nitrides. AIXTRON G 4 system comes with two different reactor configurations, the RTP and Single Wafer configuration. The RTP (Rapid Thermal Processing) reactor configuration of G4 provides its users with an extremely rapid thermal cycle time of up to 200°C per second. This enables the user to rapidly process materials and greatly increase deposition throughput rate. The RTP also provides users with precise in-situ temperature control, allowing for more efficient uniform thin film growth and reduced time for equipment calibration. The Single Wafer configuration on the other hand, provides a highly advanced process control environment that enables users to deposit materials on wafers directly, thus eliminating the need for additional manual process steps. Another great feature of G 4 is its high level of automation. Features such as the real-time process monitoring unit, automated process control, on-board material handling and automatic wafer return systems provide users with an efficient and high quality deposition process. In addition, the machine is equipped with an advanced fault-tolerant platform, providing users with reliable and high performance tool operations and reduced downtime. These features make AIXTRON G4 a great reactor for processes such as epitaxy, photovoltaics or LED fabrication. Its rapid thermal cycle time allow it to deposit multiple layers of materials in a short amount of time, while its high level of automation make it a reliable tool for running processes in a continuously. Finally, AIXTRON G 4 reactor is designed to provide users with maximum flexibility when it comes to material choice, and high overall process performance.