Used AIXTRON G4 #9382363 for sale

AIXTRON G4 is a state-of-the-art reactor specifically designed to improve the performance of microwave plasma-enhanced chemical vapor deposition (MPCVD) systems. AIXTRON G 4 stands out amongst other reactors due to its integrated process control, long deposition runs and repeatable deposition results. It also has a patented design, with a laboratory-grade rotating cylinder chamber and an insulated hexagonal cavity. This reactor is suitable for both prototype production as well as for medium-to-high volume production. G4 uses microwave energy to create a plasma, which enables the precision depositing of films, layers and layers of films. It uses an e-gun with a multiple-source feature that allows for the independent control of both the gas mixture and the pressure in different layers. The gas mixture can be both reactive and inert and can be precisely monitored, allowing for intricate control of the growth films. G 4 is also equipped with a pressure sensor and a gas control system that is operated externally. This allows for temperature management and better control of plasma process parameters. It is also equipped with a vacuum system that is two times more efficient, which allows for long deposition runs with repeatable results. Its core process capabilities include accurate film thickness and excellent stoichiometry. It also features high-quality films, superior electron mobility, and outstanding growth rates, in addition to being able to generate films with properties and compositions that are difficult to achieve in other systems. AIXTRON G4 also excels in its monitoring and controlling capabilities, featuring real-time online monitoring of plasma parameters, as well as data logging. This allows for easy archiving and retrieval of data and information. In conclusion, AIXTRON G 4 is an advanced, versatile and reliable reactor that can greatly improve the performance of MPCVD systems. Its patented design, high-quality films, temperature control and long deposition runs, make it ideal for both prototyping and production use, in applications ranging from nanotechnology to semiconductor manufacturing.