Used AIXTRON G5 HT #9238747 for sale

AIXTRON G5 HT is a state-of-the-art high-temperature CVD reactor designed for a wide range of industrial applications. It is a 6-inch automated, compact platform that provides a reliable, low-cost way to synthesize and process a range of materials at high temperatures and vacuum pressures. Equipped with a high-temperature burner, AIXTRON G5HT reactor offers a controlled environment that can reach up to 1,200°C with precise temperature control. The system is highly efficient and can be used to produce high-density films of virtually any material including semiconductors, metals, ceramics, and a variety of polymers. G5 HT reactor features a number of user-friendly features, such as an adjustable precursor injector, a variable magnetic field, and an automated loading system. Operators can precisely control the flow of precursors, allowing for maximum material deposition in the single wafer uniformity. The reactor's temperature-controlled substrate holder ensures uniform heating and distributes the heat evenly throughout the sample. Additionally, the adjustable magnetic field allows for compression and enlargement of magnetic domains which can improve material properties such as crystallinity. The reactor also benefits from a Scanning Electron Microscope (SEM) insert, allowing for real-time examination of the formed layers. The SEM enables cycle-time optimizations and allows for the observation of the thin film formation and the surface morphology. G5HT comes with a powerful software package to monitor, control and analyze the manufacturing process. The software uses a graphical user interface (GUI) to allow users to quickly and easily set up and manipulate the deposition parameters. Thanks to its various adjustable parameters and high temperature range, AIXTRON G5 HT is an ideal system for a wide variety of industrial applications, such as thin film deposition, prototyping, and product metrology.