Used AIXTRON G5 #9222132 for sale

AIXTRON G5 is a state-of-the-art deposition tool for the production of high quality thin film materials. Based on revolutionary evaporation/sputtering and imaging techniques, its capabilities enable users to produce films with high conformality and control of the growth parameters. AIXTRON G 5 consists of a high-precision reactor chamber surrounded by several external units. The chamber itself is made of stainless steel, designed to maintain an operating pressure of 10-4 mbar. Inside the chamber is the sputter and evaporation source, consisting of four targets for sputtering and four evaporation boats. These targets can be used to deposit films with thicknesses ranging from a few nanometers to several microns. The deposition rate and operating temperature are both adjustable, with temperatures up to 800°C and deposition rates of over 5nm/second. The control system of G5 is based on an intelligent software package, enabling users to carry out real-time optimization of the deposition parameters. Automatic or manual control of the sputter and evaporation targets is available, as well as batch processes, allowing the user to start and stop processes without intervention. The system also includes a crystal-free diffraction analysis unit, capable of analyzing and controlling the process in real time to achieve the best possible film quality. G 5 reactor is equipped with a range of different chambers and in-situ capabilities, such as off-axis and in-situ temperature measurements, IR imaging, and four-point probe electrical characterization. These in-situ capabilities provide a great source of information about the film structure, while also allowing the user to fine-tune the process conditions for a better film quality. AIXTRON G5 is specifically designed for the fab of high-quality thin films. It has been used to produce materials for a wide range of applications, including optoelectronic devices, semiconductors, photovoltaics, and fuel cells. The system is also suitable for research and development of new materials and processes. AIXTRON G 5 is an advanced deposition tool, offering the flexibility that advanced manufacturing processes require. Its combination of automated control systems, advanced in-situ capabilities, and high precision in operation make it an ideal tool for the production of high quality films.