Used AIXTRON G5 #9225886 for sale

AIXTRON G5 is a high-temperature poly-silicon reactor used for the deposition process of silicon-based materials. It is developed and manufactured by AIXTRON, a leading provider of deposition systems for the semiconductor and electronics industries. AIXTRON G 5 reactor is designed to deliver a reliable and cost-effective deposition process. It is suitable for thin-film deposition of a variety of materials including: silicon dioxide, silicon nitride, silicon-germanium, aluminum oxide, catalytic oxides, and aluminum nitride. G5 reactor utilizes a cylindrical graphite susceptor in which the substrate is placed. The susceptor is then heated by two infrared lamps within the reactor, creating a process temperature of up to 1250ºC. Process temperature is controlled using a PID temperature control, while precise deposition rate is regulated using an on-board control head. Furthermore, a closed-loop process control system employs multi-point temperature surveillance to provide precise and uniform temperature distribution. This ensures repeatable substrate temperature in each and every process cycle. G 5 also features a range of analytical tools and a fully automated process sequence. At every step of the process, numerous parameters such as temperature, pressure, and process time can be monitored and controlled, enabling the achievement of consistent and repeatable results. An in-situ precursor dosing system allows an exact dose to be accurately metered into the reactor, ensuring uniform and precise deposition. AIXTRON G5 reactor is capable of accommodating a variety of substrate sizes and forms including: circular, rectangular, oval, or even irregular polygon shapes. Furthermore, it can achieve a deposition rate of up to 7nm/min and is highly efficient at utilizing precursor material, reducing waste emission to a minimum. To ensure consistent results, various safeguards including sensor-integrated probes are in place to monitor the process and protect the reactor from potential harm. AIXTRON G 5 reactor provides a reliable and highly efficient platform for thin-film silicon deposition. It is capable of delivering consistent results and is suitable for a wide range of applications in the semiconductor and electronics sectors.