Used AIXTRON G5 #9238984 for sale

AIXTRON G5 is a state-of-the-art deposition equipment designed for mass production and research. The system is equipped with remote plasma-enhanced chemical vapor deposition technology for production of thin-film materials such as refractory metal silicides and semiconductors. AIXTRON G 5 is a multilevel cluster tool designed to perform simultaneous co-sputtering and ALE deposition processes. The unit features a high precision wafer coding unit, four sputter sources, two magnetron sources, one laser source, high flexibility in chamber configuration and tool control software. In addition, the machine includes a positioning module for wafer movement and operation, as well as a liner source for direct processing and a DC/AC source for secondary processing. G5 reactor is designed to provide superior uniformity and film quality, while allowing up to 6-inch and 8-inch wafers to be processed. G 5 features a unique sputter panel design to provide precise etching control and resulting smooth wafer surface. The unique design also supports close-tolerance coating for high line width accuracy and registration. AIXTRON G5 tool offers flexibility with different programming solutions, enabling users to program the asset without the need for a separate computer. The model also features a process temperature manager, which ensures constant temperature and material deposition rates for optimized etching and deposition throughout the entire process. Additionally, AIXTRON G 5 is designed for high-throughput production and offers high reliability and repeatability throughout the production process. G5 reactor is a one-stop solution for all etching and deposition processes and offers excellent process control capabilities. Designed for higher-throughput and for the development of high-quality thin-films, G 5 is the ideal choice for advanced research and production needs.