Used AIXTRON G5 #9363425 for sale

AIXTRON G5 is an advanced, 5-inch-diameter, state-of-the-art reactor used for semiconductor and optoelectronics applications. Manufactured by AIXTRON, AIXTRON G 5 enables production of nanostructures, nanotechnology, and optically-active electronics components, as well as devices with nanoscale features. G5 is based on a unique substrate-supported design that uses proprietary nano-engineered porous materials and enables precise control of a conformal structure. This flexibility offers a range of process parameters, allowing for high quality, high throughput, and repeatable results. The reactor's main feature is the combination of a cylindrical, gas-tight reaction chamber; a high pressure gas-flow system; and dedicated substrates made from materials such as gallium nitride, silicon, and sapphire. G 5 also features three key operational modes: high pressure, low pressure and cooling mode. These modes ensure an optimal use of resources to acquire desired results. In high pressure mode, AIXTRON G5 provides the capability to control and measure temperatures up to 1,200 °C (2,192 °F). In low pressure mode, temperature control is greater and temperatures up to 1,500 °C (2,732 °F) can be achieved. The cooling mode also offers optimal cooling parameters with temperatures from -80°C to 30°C (-112°F to 86°F). AIXTRON G 5 can be used to conduct a wide range of processes, from wide area patterning with continuous film deposition to nanostructure formation, as well as patterning of elements with other substrates at high temperatures. It is widely used for the production of LEDs, thin film solar cells, and other optoelectronics components. In addition, G5 supports varied reactor surfaces, both in terms of materials and structure. This supports high resolution, uniformity, tight process control, and accuracy up to nanometer scale. Moreover, it offers an extended period of operation with long cycle times and long intervals between jobs. All in all, G 5 is an excellent tool for producing high-performance electronics components, nanoscale devices, and optoelectronic applications. Its varied operating modes, powerful gas-flow system, and conformal substrate support base make it the perfect choice for fast and accurate high-end production.