Used AIXTRON Gen 3.5 #9067299 for sale
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ID: 9067299
Polymer Vapour Phase Deposition (PVPD) system
Dual stage load lock with independent vacuum system
Deposition chamber: Typically 0.1 mbar - 1000 mbar
Passive mask alignment accuracy: +/- 5 mm
Electro chuck for Gen 3.5 (0°-40° C)
Parylene-c pyrolyser
Gen 3.5 Shower head
Gap switch
Independent vacuum system with (2) pumps
(4) Mask capability
E-rack module
Water panel
Control display panel
Gas mixing unit
Pneumatic system
E-Racks
Control system
Safety system.
AIXTRON Gen 3.5 is a state-of-the-art, ultra-high-pressure epitaxial growth reactor. The reactor is designed for advanced growth applications, such as the production of novel opto-electronic and nano-electronic materials, especially Group III-V materials used in opto-electronic devices and nano-electronics. AIXTRON Gen 3.5 is equipped with an innovated 'Easy-to-Use' user interface, ensuring operation and maintenance of up to three chambers simultaneously. AIXTRON Gen 3.5 is powered by a unique multi-anode UHV/DP reactor source. This powerful source allows for greater flexibility and precise control over the material deposition, enabling the production of high quality Group III-V opto-electronic and nano-electronic materials. It also provides the ability to perform advanced epitaxial layer engineering, allowing for a broader range of applications. The reactor design features a number of improvements over its predecessor, the Gen 2.5. This includes faster deposition rates up to 0.5µm/min, improved homogeneity due to superior pressure characteristics, minimized contamination to enhanced wafer uniformity and yield, along with a reduction in process temperature to as low as 500C. AIXTRON Gen 3.5 features integrated process monitoring, which informs the user of optimal parameters for detailed and accurate deposition of Group III-V material. The system can also internally regulate conditions to ensure ideal process consistency and efficiency. With its highest quality and highest performing capabilities, it is ideal for epitaxial layer engineering for novel opto-electronic and nano-electronic applications such as light emitting diodes (LEDs). AIXTRON Gen 3.5 is one of the most-advanced epitaxial growth reactors on the market. Its numerous innovative features, such as fast deposition rates, advanced process monitoring, and contaminant control, make it an ideal choice for the production of advanced opto-electronic and nano-electronic materials. Its excellent capability along with its easy-to-use user interface will provide customers with an unequaled epitaxial growth platform.
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