Used AIXTRON LYNX-II #9092877 for sale

AIXTRON LYNX-II is an advanced Plasma Enhanced Chemical Vapor Deposition (PECVD) reactor used for thin film deposition. It is built using a Closed Coupled Showerhead (CCS) architecture, capable of supporting a large variety of substrates, including silicon, sapphire, glass, and others. The reactor is designed to deposit oxide and polymer films, and features a high degree of thermal uniformity. Its configuration allows for a range of processes to be performed, including Metal Organic Chemical Vapor Deposition (MOCVD), Atomic Layer Deposition (ALD), Pyrolysis, and Low Pressure Chemical Vapor Deposition (LPCVD). LYNX-II reactor features a high-vacuum chamber with a high flow of plasma gas in order to achieve high-rate film deposition. The chamber is equipped with optical windows to allow for easy monitoring of the process. The reactor also contains a two-zone chamber which allows for independent temperatures to be set on each side. This dual-zone design helps to reduce condensation and Reaction-Induced Plasma Purge (RIPP) problems. The substrate is loaded into the chamber using a robotic substrate transfer equipment, which is able to accommodate up to six substrates. This system utilizes a two-axis stage for precise control of substrate position. AIXTRON LYNX-II reactor can be equipped with a diffusion pump to create higher pressure plasma processes. The diffusion pump can be coupled to an AFC® Control Unit, which can be used to control process parameters. The control machine for LYNX-II reactor is the 'AFC Control II'. This tool contains a touchscreen interface which allows the user to control a variety of parameters, such as chamber pressure, temperature, and flow control. The asset is also capable of generating alarms when a process parameter is reached or exceeded. The AFC Control II also has a 'Log/Record' feature, which stores all process recipes and information. AIXTRON LYNX-II reactor features a high-purity 'glass-to-metal' seal construction, which provides a high degree of material compatibility. This allows materials of different materials to be deposited, including metals, oxides, nitrides, and polymers. The use of stainless steel hardware helps to minimize contamination. Overall, LYNX-II is a powerful and reliable PECVD reactor for thin film deposition. Its CCS architecture enables simultaneous deposition of a range of materials on a substrate, and its advanced control model allows for precise control of process parameters. The reactor is ideal for a variety of applications, and is an essential tool in industrial thin film processing.